KWIETNIEWSKI, Norbert; ZHANG, Andy; LIM, Jang-Kwon; BAKOWSKI, Mietek; SOCHACKI, Mariusz; SZMIDT, Jan. Silicon carbide surface micromachining using plasma ion etching of sacrificial layer. International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 192–194, 2013. DOI: 10.3384/wcc2.192-194. Disponível em: https://www.wcc.ep.liu.se/index.php/PSE/article/view/427. Acesso em: 10 dec. 2025.