LOCH, Daniel A.L.; EHIASARIAN, Arutiun P. Study of the ionisation in a nickel plasma by Inductively Coupled Impulse Sputtering (ICIS). International Conference on Plasma Surface Engineering, [S. l.], v. 2, n. 13, p. 108–111, 2013. DOI: 10.3384/wcc2.108-111. Disponível em: https://www.wcc.ep.liu.se/index.php/PSE/article/view/404. Acesso em: 28 jul. 2025.